| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface inspection device capable of acquiring a high-resolution image in a wavelength range including ultraviolet light. Ž<P>SOLUTION: An imaging part 35 of the surface inspection device includes: a visible light imaging element 38 for imaging a wafer supported on a stage; an objective lens 36 for receiving ultraviolet light from the surface of the wafer supported on the stage and forming an image of the wafer by ultraviolet light as an intermediate image; a fluorescent screen 43 for converting the intermediate image formed by the objective lens 36 into an intermediate image by visible light; and an imaging lens 44 for forming the intermediate image by visible light on an imaging surface of the visible light imaging element 38. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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