发明名称 |
ELECTRON BEAM PROCESSING DEVICE AND METHOD USING CARBON NANOTUBE EMITTER |
摘要 |
Methods and devices for selective etching in a semiconductor process are shown. Chemical species generated in a reaction chamber provide both a selective etching function and concurrently form a protective coating on other regions. An electron beam provides activation to selective chemical species. In one example, reactive species are generated from a plasma source to provide an increased reactive species density. Addition of other gasses to the system can provide functions such as controlling a chemistry in a protective layer during a processing operation. In one example an electron beam array such as a carbon nanotube array is used to selectively expose a surface during a processing operation.
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申请公布号 |
US2010221922(A1) |
申请公布日期 |
2010.09.02 |
申请号 |
US20100780686 |
申请日期 |
2010.05.14 |
申请人 |
RUEGER NEAL R;WILLIAMSON MARK J;SANDHU GURTEJ S |
发明人 |
RUEGER NEAL R.;WILLIAMSON MARK J.;SANDHU GURTEJ S. |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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