EXPOSURE APPARATUS

摘要

An exposure apparatus is provided with: a transfer means (1) which places a subject to be exposed (7) on the upper surface and transfers the subject in the fixed direction; a spatial light modulating means (3), which has a plurality of light modulating elements (9), which are composed of an electro-optical crystalline material and are arranged at a predetermined pitch at least in one row in the direction intersecting the transfer direction of the subject to be exposed (7); an optical beam shaping means (4) which limits the width of light outputted from each light modulating element (9) to a predetermined width in the transfer direction; and a control means (6) which on/off controls transmitting light of the spatial light modulating means (3) by individually driving the light modulating elements (9) so as to generate a predetermined pattern. In each light modulating element (9), a cross-sectional shape that orthogonally intersects the optical axis is formed in a substantially rectangular shape which is long in the transfer direction of the subject to be exposed (7), and the light modulating element is tilted by a predetermined angle with respect to an axis parallel to the transfer direction. The control means (6) shifts the optical beam shaping means (4) in the transfer direction. Thus, alignment accuracy of the pattern generated by means of the light modulating elements composed of the electro-optical crystalline material and the exposure position of the subject to be exposed is improved.