| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a coating processor that suppresses unnecessary consumption of a resist liquid as much as possible, and can adjust the viscosity of the resist liquid on an in-line basis without lowering the throughput. Ž<P>SOLUTION: The coating processor includes: a dilute coating liquid supply mechanism comprising a mixing unit 70 for mixing a high-concentration coating liquid and a solvent together to prepare a dilute coating liquid diluted to a predetermined concentration, a coating liquid discharging mechanism 14 for discharging the dilute coating liquid to form a coating film on a substrate, feeding piping 69 for feeding the dilute coating liquid from the mixing section 70 to the coating liquid discharging mechanism 14, a buffer tank 71 for temporarily reservoiring the dilute coating liquid from the feeding piping 69, and a supply pump 74 for supplying the dilute coating liquid from the buffer tank 71 to the coating liquid discharging mechanism 14; a dilute liquid circulation section which receives the dilute coating liquid from the buffer tank 71 and returns it to the mixing section 70 for circulation; and a switching mechanism for changing the feed destination of the dilute coating liquid between the side of the coating liquid discharging mechanism 14 and the side of the coating liquid circulation section. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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