发明名称 NOZZLE SUBSTRATE, METHOD OF MANUFACTURING NOZZLE SUBSTRATE, DROPLET DISCHARGE HEAD, METHOD OF MANUFACTURING DROPLET DISCHARGE HEAD, AND DROPLET DISCHARGE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a nozzle substrate suppressing a member with a liquid discharge nozzle from being damaged, or discharge characteristics of a discharge device containing the member from being deteriorated due to insufficient strength of the member, and to provide a method of manufacturing the nozzle substrate, a droplet discharge head, a method of manufacturing the droplet discharge head, and a droplet discharge apparatus. SOLUTION: The nozzle substrate having the liquid discharge nozzle formed on a silicon substrate, includes a recessed part opened to the surface on a side where the liquid is discharged from the discharge nozzle. An opening on the side of the surface, where the recessed part is opened, is opened to the bottom surface of the recessed part, then the discharge nozzle penetrates to the opposite side of the surface, where recessed part is opened from the bottom surface. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010191034(A) 申请公布日期 2010.09.02
申请号 JP20090033598 申请日期 2009.02.17
申请人 SEIKO EPSON CORP 发明人 KOMIZO KOICHIRO;OTANI KAZUFUMI
分类号 G02B5/20;B05C5/00;B81B3/00;B81C1/00 主分类号 G02B5/20
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