发明名称 |
METHOD OF TREATING A SURFACE OF AT LEAST ONE PART BY MEANS OF INDIVIDUAL SOURCES OF AN ELECTRON CYCLOTRON RESONANCE PLASMA |
摘要 |
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.
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申请公布号 |
US2010219160(A1) |
申请公布日期 |
2010.09.02 |
申请号 |
US20080681203 |
申请日期 |
2008.10.09 |
申请人 |
H.E.F. |
发明人 |
SCHMIDT BEAT;HEAU CHRISTOPHE;MAURIN-PERRIER PHILIPPE |
分类号 |
C23F1/08;C23C16/00;C23C16/44;C23F1/00;H05H1/24 |
主分类号 |
C23F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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