| 摘要 |
<p>The present invention provides a method for manufacturing a solar cell, including: diffusing p type impurity into at least a portion of a first surface, which is one surface of a silicon substrate (1), to form a high concentration p type impurity diffusion layer (2); and etching one of the first surface of the silicon substrate (1) and a second surface of the silicon substrate (1) opposite to the first surface, using as a mask at least one of the high concentration p type impurity diffusion layer (2) and a film formed on the high concentration p type impurity diffusion layer (2) upon forming the high concentration p type impurity diffusion layer (2).</p> |
