发明名称 METHOD FOR GENERATING LASER BEAM RADIATION TRAJECTORIES FOR PROCESSING SEMICONDUCTOR PACKAGES
摘要 PURPOSE: A method for generating laser beam irradiation trajectories for processing a semiconductor package is provided to easily produce a spiral trajectory by processing a via hole of a package with a spiral pattern which is automatically produced. CONSTITUTION: A via hole is processed by irradiating a laser beam to a mold unit of a semiconductor package along a spiral trajectory. One of spiral trajectory patterns is selected in the controller of a laser beam irradiating device. The spiral trajectory is generated by inputting information about the selected spiral trajectory pattern. A laser beam irradiation condition is inputted.
申请公布号 KR20100095735(A) 申请公布日期 2010.09.01
申请号 KR20090014698 申请日期 2009.02.23
申请人 HANMISEMICONDUCTOR CO., LTD. 发明人 HUH, YIL;CHOI, HONG CHAN;KIM, YOUNG HWAN
分类号 H01L21/00;H01L23/00 主分类号 H01L21/00
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