| 摘要 |
A method of manufacturing a substrate for a liquid discharge head (10), comprising the steps of:
providing a silicon substrate (1) having a first surface opposed to a second surface and having a layer (4) on the second surface of the silicon substrate, wherein the layer has a lower etch rate than silicon when exposed to an etchant of silicon;
partially removing the layer so as to expose part of the second surface of the silicon substrate, wherein the exposed part surrounds at least one part of the layer; and wet etching the layer and the exposed part of the second surface of the silicon substrate, using the etchant of silicon, to form a liquid supply port (13) extending from the second surface to the first surface of the silicon substrate.
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