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发明名称
An electrical power supply suitable in particular for dc plasma processing
摘要
申请公布号
EP1278294(B9)
申请公布日期
2010.09.01
申请号
EP20010202697
申请日期
2001.07.16
申请人
CPAUTOMATION S.A.
发明人
RUFER, ALFRED-CHRISTOPHE;ZIMMERMANN, CLAUDIO;MULLER, FREDERIC;BULLIARD, ALBERT
分类号
H02M3/28;H02M3/335;H02M3/337
主分类号
H02M3/28
代理机构
代理人
主权项
地址
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