发明名称 SYSTEMS AND METHODS FOR CALIBRATING END EFFECTOR ALIGNMENT USING AT LEAST A LIGHT SOURCE
摘要 A method for calibrating alignment of an end effector with respect to a chuck in a plasma processing system is disclosed. The method includes providing a first light beam from the end effector to said chuck, moving the end effector along a predefined calibration path such that the first light beam traverses a surface of the chuck, receiving a set of reflected light signals being generated at least when the surface reflects the first light beam during the moving, and analyzing the set of reflected light signals to identify three or more discontinuities, generated when the first light beam encounters an edge of the chuck. The method also includes determining three or more coordinate data points representing three or more points on the edge of the chuck, and determining a center of the chuck based on the three or more coordinate data points.
申请公布号 KR20100096260(A) 申请公布日期 2010.09.01
申请号 KR20107016639 申请日期 2008.12.19
申请人 LAM RESEARCH CORPORATION 发明人 ALLEN BLANCHETTE CHRISTINE;RODNICK MATT
分类号 H01L21/677;B25J13/00;H01L21/3065;H01L21/687 主分类号 H01L21/677
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