| 摘要 |
Process for removing halide compounds adhering to finely divided metal oxide particles by means of steam, wherein the metal oxide particles are applied to the upper part of an upright column and migrate downwards by means of gravity, the steam is applied at the bottom end of the column, the metal oxide particles and the steam are fed counter-currently, the metal oxide particles freed of halide residues are removed at the base of the column, steam and halide residues are removed at the head of the column, wherein the column is heated in such a manner that the temperature difference Tbottom−Ttop between the lower part and the upper part of the column is at least 20° C. and a maximum temperature of 500° C. prevails in the column, and the metal oxide particles have a residence time in the column of from 1 second to 30 minutes.
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