发明名称 Semiconductor device and method of fabricating the same
摘要 A semiconductor device includes a transistor having a recessed gate, contact plugs formed in a region of a plurality of trenches, which are formed by recessing a semiconductor substrate. Further, a metal line and a source/drain region can be connected through the contact plug, so that on-current can be increased as much as an increased channel area.
申请公布号 US7786529(B2) 申请公布日期 2010.08.31
申请号 US20070943791 申请日期 2007.11.21
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM DAE SIK
分类号 H01L29/772 主分类号 H01L29/772
代理机构 代理人
主权项
地址