| 摘要 |
The invention relates to an electrode having a nano-hollow array on the surface thereof, the nano-hollow array comprising a plurality of nano-pores or nano-balls, each pore having a diameter of less than 500 nm, formed by a process comprising depositing a uniform metal film on the electrode structure surface at a rate of 2 Å per second or less, annealing the metal film under rapid anneal conditions at a temperature within about 100 degrees of the melting point of the metal film and without subjecting the metal film to a temperature ramp-up to create metal droplets, and anodizing and over-anodizing the metal droplets in the presence of an anodization agent for the metal at from 20 to 200 volts at 0.1 to 2 amps to create nano-pores in the metal droplets or nano-balls to, creating increased surface area and increased electric field around the electrode which enhances speed of fill gas ionization.
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