发明名称 |
Substrate and mask aligning apparatus |
摘要 |
A substrate and mask aligning apparatus includes a controlling portion 70 for calculating moving data that are applied to eliminate a difference between a present superposed state of the through holes 52 of the mask 50, which comes into contact with the substrate 20 that is loaded on the stage 30, on the pads 22 of the substrate 20 and a scheduled superposed state on the basis of image data from the shooting section 40, 42 and then executing repeatedly an operation to move the stage 30 on the basis of the calculated moving data of the stage.
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申请公布号 |
US7788061(B2) |
申请公布日期 |
2010.08.31 |
申请号 |
US20080178767 |
申请日期 |
2008.07.24 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
TAKEUCHI YUKIHARU;SAKAGUCHI HIDEAKI |
分类号 |
G01C17/00 |
主分类号 |
G01C17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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