VACUUM ARC DEPOSITION DEVICE HAVING A DUAL BANDED PLASMA DUCT

摘要

PURPOSE: A vacuum arc deposition device having a double bending plasma duct is provided to achieve reduced device size because the straight length of the double bending plasma duct is shorter than that of a single bending plasma duct. CONSTITUTION: A vacuum arc deposition device having a double bending plasma duct comprises an evaporation unit, a plasma duct, and a magnetic field generating unit. The plasma duct comprises a first bent portion which has a first radius of curvature and a first center of curvature and a second bent portion which is extended from the first bent portion and has a second radius of curvature and a second center of curvature facing the first center of curvature. The magnetic field generating unit comprises a first and a second magnetic field source surrounding the plasma duct, and a first and a second induced magnetic field source.