| 摘要 |
<p>PURPOSE: A mask-aligning apparatus and a method for using the same are provided to reduce the waste of wafers by forming several patterns on one mask and performing photo-lithographic operations. CONSTITUTION: An ultraviolet generating apparatus(110) provides light source which is required for photo-lithographic operations. A mask(10), which is used for the photo-lithographic operations and on which several mask patterns are formed, is mounted to a mask mounting part(120). A wafer mounting part(130) supports a wafer(W) on which the photo-lithographic operations are performed.</p> |
