发明名称 |
NONVOLATILE MEMORY DEVICE AND METHOD OF FORMING THE SAME |
摘要 |
<p>PURPOSE: A nonvolatile memory device and a forming method thereof are provided to improve the reliability of a nonvolatile memory device by preventing a charge trap layer trapped on a first region from being moved to a second region. CONSTITUTION: A device isolation pattern(120) defines an active region(110) on a semiconductor substrate and is extended in a first direction. A charge trap layer(140) covers the active region and a device isolation pattern. A word line(160) is extended in a second direction cross the active region of the charge trap layer.</p> |
申请公布号 |
KR20100095263(A) |
申请公布日期 |
2010.08.30 |
申请号 |
KR20090014449 |
申请日期 |
2009.02.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
NAKANISHI TOSHIRO;PARK, CHAN JIN;CHOI, SI YOUNG;KOO, BON YOUNG |
分类号 |
H01L27/115;H01L21/8247;H01L29/792 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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