发明名称 NONVOLATILE MEMORY DEVICE AND METHOD OF FORMING THE SAME
摘要 <p>PURPOSE: A nonvolatile memory device and a forming method thereof are provided to improve the reliability of a nonvolatile memory device by preventing a charge trap layer trapped on a first region from being moved to a second region. CONSTITUTION: A device isolation pattern(120) defines an active region(110) on a semiconductor substrate and is extended in a first direction. A charge trap layer(140) covers the active region and a device isolation pattern. A word line(160) is extended in a second direction cross the active region of the charge trap layer.</p>
申请公布号 KR20100095263(A) 申请公布日期 2010.08.30
申请号 KR20090014449 申请日期 2009.02.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NAKANISHI TOSHIRO;PARK, CHAN JIN;CHOI, SI YOUNG;KOO, BON YOUNG
分类号 H01L27/115;H01L21/8247;H01L29/792 主分类号 H01L27/115
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