发明名称 |
USE OF CMP FOR ALUMINUM MIRROR AND SOLAR CELL FABRICATION |
摘要 |
<p>The invention is directed to a method of polishing a surface of a substrate comprising aluminum, comprising contacting a surface of the substrate with a polishing pad and a polishing composition comprising an abrasive, an agent that oxidizes aluminum, and a liquid carrier, and abrading at least a portion of the surface to remove at least some aluminum from the substrate and to polish the surface of the substrate, wherein the abrasive is in particulate form and is suspended in the liquid carrier.</p> |
申请公布号 |
SG163546(A1) |
申请公布日期 |
2010.08.30 |
申请号 |
SG20100046977 |
申请日期 |
2006.06.22 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
BRUSIC, VLASTA;JENKINS, RICHARD;THOMPSON, CHRISTOPHER |
分类号 |
|
主分类号 |
|
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|