发明名称 |
CONDUCTIVE OXIDE SINTERED BODY, SPUTTERING TARGET FORMED FROM SAID SINTERED BODY, AND MANUFACTURING METHOD THEREOF |
摘要 |
A SRRUO3 CONDUCTIVE OXIDE SINTERED BODY CHARACTERIZED IN THAT THE RELATIVE DENSITY IS 93% OR MORE. BY IMPROVING THE ADDITIVE AMOUNT AND SINTERING CONDITIONS OF BI2O3, THE PRESENT INVENTION SEEKS TO IMPROVE THE RELATIVE DENSITY OF A SRRUO3 CONDUCTIVE OXIDE SINTERED BODY, AND TO PROVIDE A CONDUCTIVE OXIDE SINTERED BODY CAPABLE OF SUPPRESSING THE GENERATION OF PARTICLES DURING SPUTTERING UPON FORMING A THIN FILM AND IMPROVING THE QUALITY AND PRODUCTION YIELD; A SPUTTERING TARGET FORMED FROM SUCH SINTERED BODY; AND THE MANUFACTURING METHOD THEREOF.
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申请公布号 |
MY142079(A) |
申请公布日期 |
2010.08.30 |
申请号 |
MYPI20032836 |
申请日期 |
2003.07.29 |
申请人 |
NIPPON MINING & METALS CO., LTD. |
发明人 |
RYO SUZUKI |
分类号 |
C04B35/00;H01B1/08;C04B35/488;C04B35/50;C23C14/34 |
主分类号 |
C04B35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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