发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A non-volatile memory device and a method for manufacturing the same are provided to uniformly maintain the threshold voltage and the Ion/Ioff rate in an identical device. CONSTITUTION: A first electrode(12) and a second electrode(17) are formed on a substrate(11). Conductive organic layers(13, 16) are formed between the first electrode and the second electrode. A nano-crystal layer(15) is formed in the conductive organic layers. The nano-crystal layer includes a plurality of nano-crystals which is covered by an amorphous barrier. A driving unit drives both terminals of the first electrode and the second electrode.</p>
申请公布号 KR20100094969(A) 申请公布日期 2010.08.27
申请号 KR20100079028 申请日期 2010.08.16
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, JAE GUN;SEO, SUNG HO;NAM, WOO SIK;OH, YOUNG HWAN;KIM, YOOL GUK;SEUNG, HYUN MIN;LEE, JONG DAE
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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