NON-VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要
<p>PURPOSE: A non-volatile memory device and a method for manufacturing the same are provided to uniformly maintain the threshold voltage and the Ion/Ioff rate in an identical device. CONSTITUTION: A first electrode(12) and a second electrode(17) are formed on a substrate(11). Conductive organic layers(13, 16) are formed between the first electrode and the second electrode. A nano-crystal layer(15) is formed in the conductive organic layers. The nano-crystal layer includes a plurality of nano-crystals which is covered by an amorphous barrier. A driving unit drives both terminals of the first electrode and the second electrode.</p>
申请公布号
KR20100094969(A)
申请公布日期
2010.08.27
申请号
KR20100079028
申请日期
2010.08.16
申请人
HYNIX SEMICONDUCTOR INC.
发明人
PARK, JAE GUN;SEO, SUNG HO;NAM, WOO SIK;OH, YOUNG HWAN;KIM, YOOL GUK;SEUNG, HYUN MIN;LEE, JONG DAE