发明名称 |
METHOD OF PLATING AND PLATING STRUCTURE |
摘要 |
PURPOSE: A plating method and a plating structure are provided to form an additional plating layer excluding nickel plating on an anodized metal surface, thereby achieving a stereoscopic plating structure. CONSTITUTION: A plating method comprises steps of: removing a metal layer exposed by removing a masking layer, forming a metal pattern on the metal layer, and partially anodizing the metal layer exposed around the metal pattern to form an oxidation layer(130). The metal pattern is obtained by forming the masking film out of a masking material on the metal layer and plating the metal layer from which the masking film is removed.
|
申请公布号 |
KR20100094875(A) |
申请公布日期 |
2010.08.27 |
申请号 |
KR20090014061 |
申请日期 |
2009.02.19 |
申请人 |
WONIL INTECH CO., LTD.;NAM, DONG SIK |
发明人 |
NAM, DONG SIK;LIM, JAE GYUN |
分类号 |
C25D5/02;C25D11/02 |
主分类号 |
C25D5/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|