METHOD FOR USING APPARATUS CONFIGURED TO FORM GERMANIUM-CONTAINING FILM

摘要

PURPOSE: A method for using an apparatus for depositing a germanium contained film is provided to eliminate metal which is contained in the surface of quartz by supplying hydrogen gas and oxygen gas into a reaction container and using the active species of the hydrogen gas and the oxygen gas. CONSTITUTION: A cylindrical reaction container(2) is prepared. A cover(23) is installed to the lower side of the reaction container in order to hermetically close an opening(21) of a furnace. A flange(22) is integrated into the peripheral side of the opening of the furnace. A wafer boat(25) is loaded on the center part of the cover. Four struts(26) are installed to the wafer boat.