EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source apparatus that can eliminate debris adhering to a component such as optical elements provided within a chamber.

SOLUTION: The extreme ultraviolet light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target material supply unit for supplying a target material into the chamber; a driver laser unit for irradiating the target material with a driver pulse laser beam to generate plasma; a cleaning laser unit for emitting a cleaning pulse laser beam; and a control unit for controlling an irradiation position of the cleaning pulse laser beam emitted from the cleaning laser unit so as to irradiate the component provided within the chamber with the cleaning pulse laser beam to remove the debris adhering to a surface of the component.

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