发明名称 SPIN TRANSISTOR AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To provide a spin transistor having a low-resistance electrode structure allowing efficient spin-polarized current injection, and a method of manufacturing the same. SOLUTION: This spin transistor includes a source electrode, a drain electrode, and a gate electrode on a semiconductor substrate. At least one of the source electrode and the drain electrode includes the following structure: n+ type semiconductor regions 12A, 12B are formed in a semiconductor region 12; a magnetic layer 31 containing a crystalline Heusler alloy containing at least one of cobalt (Co) and iron (Fe)is formed on the n+ type semiconductor regions 12A, 12B; and the n+ type semiconductor regions 12A, 12B and the magnetic layer 31 contain the same impurity element. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010186832(A) 申请公布日期 2010.08.26
申请号 JP20090028943 申请日期 2009.02.10
申请人 TOSHIBA CORP 发明人 MARUGAME TAKAO;ISHIKAWA MIZUE;IGUCHI TOMOAKI;SUGIYAMA HIDEYUKI;SAITO YOSHIAKI
分类号 H01L29/82;H01L43/08;H01L43/12 主分类号 H01L29/82
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