PURPOSE: The graphite ring device for the silicon epitaxial ingot yield up eliminates the impurity existing inside the silicon single crystal growing furnace. The ingot production yield is improved. CONSTITUTION: The quartz crucible(104) is accepted inside the chamber(108). The quartz crucible support stand(107) supports the quartz crucible. The heater(105) transfers the heat to the quartz crucible. The insulating material(109) locates between the chamber and heater. The graphite ring(101) installs at the upper part of the top ring(102).
申请公布号
KR20100094051(A)
申请公布日期
2010.08.26
申请号
KR20090013286
申请日期
2009.02.18
申请人
NEOSEMITECH INC.
发明人
KIM, JIN HEE;JUNG, HYUN SUK;AHN, HEE SEOK;SONG, JOON SUK;OH, MYUNG HWAN