EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICES, AND TUNING METHOD OF LASER LIGHT SOURCE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICES

摘要

PROBLEM TO BE SOLVED: To suitably rectify a wave face of laser beams variable by heat in an EUV light source device.

SOLUTION: In an amplifying system 30 for amplifying laser beams output from a laser oscillation unit 20, there are provided at least one or more of wave face correcting units 34 and a sensor 36. The sensor 36 outputs by detecting an angle (a direction) of the laser beams and variations of curvature ratio of the wave face. A wave face correcting controller (WFC-C) 50 outputs a signal to the wave face correcting unit 34 based on a measured result by the sensor 36. The wave face correcting unit 34 corrects wave faces of the laser beams to a specific wave face in accordance with the instruction from the wave face correcting controller (WFC-C) 50. Another wave face correcting unit and the sensor are provided also in a focusing system 40 which supplies the laser beams into a chamber 10.

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