发明名称 METAL THIN FILM PRODUCTION METHOD AND METAL THIN FILM
摘要 <p>Provided is a metal thin film formation method where using a metal particle dispersion, a conducting layer with a low volume resistivity is obtained on an insulated substrate. Said method includes a production step where a coating film including a metal particle dispersion is heat treated using superheated steam. Also provided is a metal thin film produced via said method. It is desirable that the coating film be formed from the metal particle dispersion being spread or printed onto the insulated substrate. The metal particle dispersion may contain a reducing agent, and the superheated steam may contain alcohol compounds.</p>
申请公布号 WO2010095672(A1) 申请公布日期 2010.08.26
申请号 WO2010JP52405 申请日期 2010.02.18
申请人 TOYO BOSEKI KABUSHIKI KAISHA;YATSUKA TAKESHI;AYUZAWA YOSHITAKA;KIZUMOTO HIROTOSHI;SHOKI KOJI 发明人 YATSUKA TAKESHI;AYUZAWA YOSHITAKA;KIZUMOTO HIROTOSHI;SHOKI KOJI
分类号 H01B13/00;B22F1/00;H01B5/14;H05K3/12 主分类号 H01B13/00
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