发明名称 VACUUM REFLOW APPARATUS
摘要 PURPOSE: A vacuum reflow apparatus is provided to improve the junction performance of a soldering process by maintaining a nitrogen atmosphere or a formic-acid atmosphere inside a vacuum chamber. CONSTITUTION: A chamber unit(100) includes a chamber housing(120) and a heater. A chuck unit(200) includes a wafer chuck(210) and a shielding wall(220). The shielding wall hermetically closes the opening of the chamber unit, and the wafer chuck is placed inside the chamber unit. An actuator forwardly or backwardly moves the shielding wall. The chamber unit and the chuck unit are interlocked to each other. A vacuum generation unit generates vacuum in the chamber unit using a vacuum pump.
申请公布号 KR20100094255(A) 申请公布日期 2010.08.26
申请号 KR20090013586 申请日期 2009.02.18
申请人 NANOSOLUTIONTECH 发明人 JEE, WON HO;KIM, SUNG OK;CHUNG, SUNG CHONG
分类号 H01L21/58 主分类号 H01L21/58
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