发明名称 WAVEFRONT ABERRATION MEASURING METHOD AND DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To solve the problem, wherein tilting of wavefront exceeds the tilting allowance of a Shack Hartman sensor, when the wavefront aberrations of a wide-angle lens whose field of view is larger than the focal distance is measured by the Shack Hartman sensor, and hence measurements cannot be performed. SOLUTION: The Shack Hartman sensor is tilted at a pupil position of a lens, and is controlled so that the tilting of wavefront is within the allowance. By performing imaging in steps and repeats, while the same position is overlaid, composition is performed so that overlaid spots overlap, and thereby, the wavefront aberration of the lens of a large pupil diameter is measured. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010185803(A) 申请公布日期 2010.08.26
申请号 JP20090030640 申请日期 2009.02.13
申请人 HITACHI LTD 发明人 YOSHITAKE YASUHIRO;YOSHIDA MINORU;OKA KEIKO
分类号 G01M11/02 主分类号 G01M11/02
代理机构 代理人
主权项
地址