SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A method for manufacturing a semiconductor device and an apparatus for processing a substrate are provided to select a catalyst for forming an oxide film or a nitride film on the surface of the substrate according to an acid dissociation constant. CONSTITUTION: A wafer(200) is loaded in a cassette(110). A cassette stage(114) is installed in a case shaped main body(111). A cassette shelf(105) is installed on the center part of the case shaped main body. A plurality of cassettes is stored in the cassette shelf. A reserve cassette shelf(107) is installed at the upper side of the cassette stage. A cassette transferring unit(118) is installed between the cassette stage and the cassette shelf.