发明名称 METHOD OF PHOTOCHEMICALLY REFORMING SURFACE OF SOLID MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a method of photochemically reforming surface of solid material by which a permanent surface reforming can be performed by a photochemical reaction even with the ultraviolet ray irradiation of a relatively small amount of energy irrespective of solid material to be reformed. SOLUTION: The method of photochemically reforming surface of solid material comprises: a step of forming a thin layer of a compound which contains chemical species and is in the form of liquid; a step of irradiating the surface of the solid material with ultraviolet rays via the thin layer to excite the surface of the solid material and the compound; and a step of introducing the chemical species to the surface of the solid material to photochemically reform the surface of the solid material, wherein, prior to the formation of the thin layer on the surface of the solid material, the surface of the solid material is treated with an activation energy or an oxidant and, thereby, the photochemical reforming of the surface of the solid material is accelerated. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010185085(A) 申请公布日期 2010.08.26
申请号 JP20100105439 申请日期 2010.04.30
申请人 MURAHARA MASATAKA 发明人 MURAHARA MASATAKA;TOKUNAGA HIROTO;MOCHIZUKI SHIGENARI
分类号 C08J7/18;C03C23/00;C04B41/80;C23C18/20 主分类号 C08J7/18
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