发明名称 Nonvolatile Memory Device and Method of Forming the Same
摘要 A nonvolatile memory device includes a device isolation pattern, a charge trap layer, and a plurality of word lines. The device isolation pattern defines an active region in a semiconductor substrate and extends in a first direction. The charge trap layer covers the active region and the device isolation pattern. The word lines on the charge trap layer cross the active region and extend in a second direction. The charge trap layer disposed in a first region where the word line and the active region cross each other has a different nitrogen content ratio from the charge trap layer disposed in a second region surrounding the first region.
申请公布号 US2010213536(A1) 申请公布日期 2010.08.26
申请号 US20100703066 申请日期 2010.02.09
申请人 NAKANISHI TOSHIRO;PARK CHANJIN;CHOI SIYOUNG;KOO BONYOUNG 发明人 NAKANISHI TOSHIRO;PARK CHANJIN;CHOI SIYOUNG;KOO BONYOUNG
分类号 H01L27/115 主分类号 H01L27/115
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