发明名称 Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
摘要 A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed.
申请公布号 US2010216076(A1) 申请公布日期 2010.08.26
申请号 US20100704899 申请日期 2010.02.12
申请人 发明人 HONG BYUNG YOU;KIM HYUNG JIN;ROH YOUNG HAN
分类号 G03F7/20 主分类号 G03F7/20
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