发明名称 |
Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby |
摘要 |
A method of selectively positioning nanostructures on a substrate is provided which includes: a first step of forming a photoresist pattern on the substrate and then control the line width of the photoresist pattern in a nano unit to form a nanometer photoresist layer; a second step of forming a protective layer for preventing adsorption of a nano-material in a patter-unformed area on the substrate on which the nanometer photoresist layer has been formed; a third step of removing the photoresist layer formed on the substrate; a fourth step of forming a positively-charged or negatively charged adsorbent layer in the area from which the photoresist layer has been removed; and a fifth step of applying a nano-material-containing solution charged in the opposite polarity of the adsorbent layer to the substrate on which the adsorbent layer has been formed. |
申请公布号 |
US2010216076(A1) |
申请公布日期 |
2010.08.26 |
申请号 |
US20100704899 |
申请日期 |
2010.02.12 |
申请人 |
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发明人 |
HONG BYUNG YOU;KIM HYUNG JIN;ROH YOUNG HAN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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