CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS
摘要
<p>A plasma processing system for processing at least a substrate with plasma. The plasma processing chamber is capable of controlling ion energy distribution. The plasma processing system may include a first electrode. The plasma processing system also includes a second electrode that is different from the first electrode and is configured for bearing the substrate. The plasma processing system may also include a signal source coupled with the first electrode. The signal source may provide a non-sinusoidal signal through the first electrode to control ion energy distribution at the substrate when the substrate is processed in the plasma processing system, wherein the non-sinusoidal signal is periodic.</p>
申请公布号
WO2010080421(A3)
申请公布日期
2010.08.26
申请号
WO2009US68186
申请日期
2009.12.16
申请人
LAM RESEARCH CORPORATION;FISCHER, ANDREAS;HUDSON, ERIC