Method for manufacturing optical surface of micro-lithography projection exposure apparatus, involves removing material in isotropic and anisotropic manner by local chemical and/or physical dry etching, and polishing removed material

摘要

The method involves removing the material in isotropic and anisotropic manner by a local chemical and/or physical dry etching, and polishing the removed material. A surface roughness is visually qualified for the chemical dry etching, and a colloidal dispersion with a particle size is carried out, where the particle size lies between 5 to 70 nanometer. The colloidal dispersion is provided with silicon dioxide, where space-resolved treatment of an optical surface is carried out by the local chemical and/or physical dry etching. An independent claim is also included for a micro-lithography projection exposure apparatus comprising an optical element.