发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METH0D FOR MANUFACTURING SAME
摘要 <p>PURPOSE: A non-volatile semiconductor memory and a method for manufacturing the same are provided to secure a curvature on the channel of a NAND string by dividing a through hole with a planar circuit shape. CONSTITUTION: A semiconductor substrate is composed of mono-crystalline silicon. A plurality of insulating films is formed on the semiconductor substrate. A laminate is formed on the semiconductor substrate. An electrode film(WL) and insulating films are alternately stacked to form the laminate. A first charge storing layer(CT1) is formed between the electrode film and a first semiconductor filler(SP1). A second charge storing layer(CT2) is formed between the electrode film and a second semiconductor filler(SP2).</p>
申请公布号 KR20100094384(A) 申请公布日期 2010.08.26
申请号 KR20100013768 申请日期 2010.02.16
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TANAKA HIROYASU;AOCHI HIDEAKI;KATSUMATA RYOTA;KIDOH MASARU;KITO MASARU;FUKUZUMI YOSHIAKI;KOMORI YOSUKE;ISHIDUKI MEGUMI;FUJIWARA TOMOKO;MATSUNAMI JUNYA;KIRISAWA RYOUHEI
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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