发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METH0D FOR MANUFACTURING SAME |
摘要 |
<p>PURPOSE: A non-volatile semiconductor memory and a method for manufacturing the same are provided to secure a curvature on the channel of a NAND string by dividing a through hole with a planar circuit shape. CONSTITUTION: A semiconductor substrate is composed of mono-crystalline silicon. A plurality of insulating films is formed on the semiconductor substrate. A laminate is formed on the semiconductor substrate. An electrode film(WL) and insulating films are alternately stacked to form the laminate. A first charge storing layer(CT1) is formed between the electrode film and a first semiconductor filler(SP1). A second charge storing layer(CT2) is formed between the electrode film and a second semiconductor filler(SP2).</p> |
申请公布号 |
KR20100094384(A) |
申请公布日期 |
2010.08.26 |
申请号 |
KR20100013768 |
申请日期 |
2010.02.16 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TANAKA HIROYASU;AOCHI HIDEAKI;KATSUMATA RYOTA;KIDOH MASARU;KITO MASARU;FUKUZUMI YOSHIAKI;KOMORI YOSUKE;ISHIDUKI MEGUMI;FUJIWARA TOMOKO;MATSUNAMI JUNYA;KIRISAWA RYOUHEI |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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