发明名称 METHOD FOR GENERATING LASER BEAM IRRADIATION TRAJECTORY
摘要 The present invention relates to a method for generating a laser beam irradiation trajectory for processing a semiconductor package, capable of automatically, accurately and easily generating a laser beam irradiation trajectory in a mold portion of the semiconductor package during manufacture of the semiconductor package. According to the present invention, the method for generating a laser beam irradiation trajectory for a semiconductor package-processing apparatus, which irradiates a laser beam onto the mold portion of the semiconductor package along a spiral trajectory to form via holes, comprises the steps of: enabling a controller of a laser beam irradiation apparatus, in which a plurality of spiral trajectory patterns are stored by types, to select one of the spiral trajectory pattern types; inputting information on the selected spiral trajectory pattern to generate a spiral trajectory; and inputting a laser beam irradiation condition.
申请公布号 WO2010095826(A2) 申请公布日期 2010.08.26
申请号 WO2010KR00707 申请日期 2010.02.05
申请人 HANMISEMICONDUCTOR CO.,LTD;HUH, YIL;CHOI, HONG CHAN;KIM, YOUNG HWAN 发明人 HUH, YIL;CHOI, HONG CHAN;KIM, YOUNG HWAN
分类号 H01L21/00;H01L23/00 主分类号 H01L21/00
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