发明名称 EPITAXIAL WAFER FOR LIGHT EMITTING DIODE, AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an AlGaInP-based epitaxial wafer for a light emitting diode whose in-plane white turbidity is small and which has a flat surface and reduces running costs for a disposal system member and a fault removal device, and a method of manufacturing the same. <P>SOLUTION: In the epitaxial wafer for the light emitting diode which has, on an n-type substrate 2, at least an n-type clad layer 4 made of an AlGaInP-based material, an active layer 5, a p-type clad layer 6, and a p-type current dispersion layer 7 made of GaP, the current dispersion layer 7 made of GaP comprises a lower current dispersion layer 7a grown at a V/III ratio of &ge;50 on the p-type clad layer 6 and an upper current dispersion layer 7b grown at a V/III ratio of &ge;30 to <50 on the lower current dispersion layer 7a. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010186950(A) 申请公布日期 2010.08.26
申请号 JP20090031466 申请日期 2009.02.13
申请人 HITACHI CABLE LTD 发明人 TOMIOKA HIROYUKI
分类号 H01L33/30 主分类号 H01L33/30
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