| 摘要 |
The invention relates to a vacuum arc vaporisation source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporisation material (31) as a cathode (32) for the production of an arc discharge on an vaporisation surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporisation surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporisation surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporisation surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporisation chamber (10) with an arc vaporisation source (1). |
