| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type resist composition capable of forming a rectangular pattern even on a special substrate of SiN, TiN, SiON, BPSG or the like, excellent in size controllability and having solution stability. SOLUTION: The substrate dependency improver for a resist contains a hydroxycarboxylic ester compound of formula 1 [where R41 is H r methyl; R42 is H, methyl, ethyl or phenyl; R43 is a 1-6C straight chain, branched or cyclic alkyl; and (n) is 0 or 1]. |
