发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a general-purpose setting method of the range of a supply current frequency, enabling securing electric power efficiency and stability in normal pressure plasma processing. <P>SOLUTION: An natural vibration frequency in discharging, under normal pressure of an LC circuit 1, including an inductor consisting of a pair of electrodes 11, 12 and a secondary coil 22b of a transformer 22 is estimated, in advance. Next, a supply current frequency to the LC circuit 1 is shifted and set so as to become its 50% of the size of the estimated natural vibration frequency. By supplying electric power at this set frequency, an electric field is applied to a space 10p of the nearly normal pressure between the mutual electrodes 11, 12, and the plasma processing is carried out. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP4532948(B2) 申请公布日期 2010.08.25
申请号 JP20040080168 申请日期 2004.03.19
申请人 发明人
分类号 H05H1/24;H01L21/205;H01L21/3065;H05H1/46 主分类号 H05H1/24
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