发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME
摘要 <p>PURPOSE: A nonvolatile semiconductor memory and its manufacturing method are provided to independently control a memory transistor by differently forming a control gate electrode of all memory transistors belonging to a memory string. CONSTITUTION: A plurality of insulating layers(15) and a membrane electrode assembly is alternately laminated on a laminate(ML). A selection gate electrode is formed on the laminate. A pillar(31) penetrates a control gate electrode and the selection gate electrode. A plurality of source lines is connected the top end part of a part of a semiconductor pillar. A plurality of bit lines is connected to the top end part of the rest of the pillar. A plurality of through holes is formed in the selection gate electrode and insulating layer.</p>
申请公布号 KR20100093490(A) 申请公布日期 2010.08.25
申请号 KR20100013281 申请日期 2010.02.12
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KATSUMATA RYOTA;KITO MASARU;KIDOH MASARU;TANAKA HIROYASU;ISHIDUKI MEGUMI;KOMORI YOSUKE;FUKUZUMI YOSHIAKI;AOCHI HIDEAKI
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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