发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having excellent sensitivity and resolution and sufficiently suppressing production of sludge, and to provide a photosensitive element, a method for forming a resist pattern and a method for manufacturing a printed wiring board by using the composition. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer containing a copolymer prepared by polymerizing a plurality of kinds of monomers, (B) a photopolymerizable compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, and (D) an organic group-containing compound expressed by general formula (1), wherein the plurality of kinds of monomers include (a) (meth)acrylic acid, (b) methyl methacrylate or ethyl methacrylate, and (c) an alkyl acrylate having 4 or more carbon atoms in an alkyl group. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP4529752(B2) 申请公布日期 2010.08.25
申请号 JP20050084636 申请日期 2005.03.23
申请人 发明人
分类号 G03F7/004;G03F7/029;G03F7/033;H05K3/06;H05K3/18 主分类号 G03F7/004
代理机构 代理人
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