发明名称
摘要 <p><P>PROBLEM TO BE SOLVED: To provide technology which can manufacture a semiconductor device by short TAT in a semiconductor production line with which conveyance of a photo mask is automated. <P>SOLUTION: A special express lot is regarded as a target for schedule constitution even in process three steps ahead of a first process. A regular wafer lot makes beginning only of the first process the object of schedule construction. Under these conditions, ranking in process is imparted by order of a special express lot ELA in process of 3 processes ahead of the first process in a list in process, a wafer lot LE in process of a first process, and a wafer lot LF in process of the first process. When groundbreaking ranking of each manufacturing apparatus contained in first equipment constellation which perform exposure process is given in order of manufacturing apparatus PEA, manufacturing apparatus PEB and manufacturing apparatus PEC; the special express lot ELA is assigned to manufacturing apparatus PEA, the wafer lot LE is assigned to the manufacturing apparatus PEB, and the wafer lot LF is assigned to the manufacturing apparatus PEC, thereby drawing up groundbreaking plan. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP4530247(B2) 申请公布日期 2010.08.25
申请号 JP20030157654 申请日期 2003.06.03
申请人 发明人
分类号 G05B19/418;H01L21/02 主分类号 G05B19/418
代理机构 代理人
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地址