发明名称 |
LIQUID CRYSTAL EXPOSURE APPARATUS |
摘要 |
PURPOSE: A liquid crystal exposure apparatus is provided to obtain a structure facilitating the position arrangement when assembling a stage, and to easily process and transport the apparatus. CONSTITUTION: A liquid crystal exposure apparatus(1) comprises the following: a work table(210,211,212) mounting the work; an operation stage including a transport device of the work table; a fixing stage(201) including a transport device of the operation stage; and a gantry unit supporting an exposing device exposing a mask pattern for the work on the work table. The fixing stage includes a structure capable of being divided into plural pieces. The fixing stage additionally includes a rail supporting the movement of the operation stage.
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申请公布号 |
KR20100093479(A) |
申请公布日期 |
2010.08.25 |
申请号 |
KR20100011320 |
申请日期 |
2010.02.08 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
WATANABE NARUO;MATSUYAMA KATSUAKI;NEMOTO RYOUJI;MAKI NOBUYUKI |
分类号 |
G03F7/20;H01L21/027;H01L21/68 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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