发明名称 LIQUID CRYSTAL EXPOSURE APPARATUS
摘要 PURPOSE: A liquid crystal exposure apparatus is provided to obtain a structure facilitating the position arrangement when assembling a stage, and to easily process and transport the apparatus. CONSTITUTION: A liquid crystal exposure apparatus(1) comprises the following: a work table(210,211,212) mounting the work; an operation stage including a transport device of the work table; a fixing stage(201) including a transport device of the operation stage; and a gantry unit supporting an exposing device exposing a mask pattern for the work on the work table. The fixing stage includes a structure capable of being divided into plural pieces. The fixing stage additionally includes a rail supporting the movement of the operation stage.
申请公布号 KR20100093479(A) 申请公布日期 2010.08.25
申请号 KR20100011320 申请日期 2010.02.08
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 WATANABE NARUO;MATSUYAMA KATSUAKI;NEMOTO RYOUJI;MAKI NOBUYUKI
分类号 G03F7/20;H01L21/027;H01L21/68 主分类号 G03F7/20
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