发明名称 GALLIUM NITRIDE-BASED SEMICONDUCTOR STACKED STRUCTURE, PRODUCTION METHOD THEREOF, AND COMPOUND SEMICONDUCTOR AND LIGHT-EMITTING DEVICE EACH USING THE STACKED STRUCTURE
摘要 A gallium-nitride-based semiconductor stacked structure includes a low-temperature-deposited buffer layer and an active layer. The low-temperature-deposited buffer layer is composed of a Group III nitride material that has been grown at low temperature and includes a single-crystal layer in an as-grown state, the single-crystal layer being present in the vicinity of a junction area that is in contact with a (0001) (c) plane of a sapphire substrate. The active layer is composed of a gallium-nitride (GaN)-based semiconductor layer that is provided on the low-temperature-deposited buffer layer. The single-crystal layer is composed of a hexagonal AlXGaYN (0.5<X≰1, X+Y=1) crystal that contains aluminum in a predominant amount with respect to gallium such that a [2.−1.−1.0.] direction of the AlXGaYN crystal orients along with a [2.−1.−1.0.] direction of the (0001) bottom plane of the sapphire substrate.
申请公布号 EP1756854(A4) 申请公布日期 2010.08.25
申请号 EP20050745588 申请日期 2005.05.25
申请人 SHOWA DENKO K.K. 发明人 UDAGAWA, TAKASHI
分类号 H01L21/205;H01L33/16;C23C16/34;H01L21/02;H01L21/20;H01L33/00;H01L33/06;H01L33/12;H01L33/20;H01L33/32;H01L33/40;H01S5/323 主分类号 H01L21/205
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