| 摘要 |
A resist stripper has a composition including a highly polar solvent containing at least one member selected from the group consisting of N-methyl-pyrrolidone(N-methyl-2-pyrrolidone), N,N-dimethyl-acetamide, dimethyl-formamide, and N,N-methyl-formamide, and an amine compound soluble in water. A resist film used and its modified hardened portion are stripped and removed by this resist stripper. |
