发明名称 ACID PLATING BATH AND METHOD FOR THE ELECTROLYTIC DEPOSITION OF SATIN NICKEL DEPOSITS
摘要 The plating bath for the deposition of satin nickel deposits according to the present invention contains at least one quarternary ammonium compound and at least one polyether, the at least one polyether having at least one strongly hydrophobic side chain. As compared to prior art plating baths, this acid plating bath has the advantage that it enables a long period of operation or heating and cooling cycles or filtration cycles, makes it possible to perform the filtration needed for continually operating the bath without using active carbon, requires a lower concentration of nickel than prior art baths to produce the satin gloss finish and has a reduced sensitivity to wetting agents that have been dragged in.
申请公布号 KR100977435(B1) 申请公布日期 2010.08.24
申请号 KR20047018940 申请日期 2003.05.15
申请人 发明人
分类号 C25D3/12 主分类号 C25D3/12
代理机构 代理人
主权项
地址