发明名称 Capacitor of semiconductor device and method for manufacturing the same
摘要 A capacitor includes a first lower metal layer and an insulating layer on a lower interlayer dielectric layer of a semiconductor substrate; a first upper metal layer aligned on the insulating layer to partially expose it; a first capping layer and an upper interlayer dielectric layer on the insulating layer including the first upper metal layer; a second lower metal layer connected to the first upper metal layer through the upper interlayer dielectric layer and the first capping layer; a second capping layer aligned on the upper interlayer dielectric layer including the second lower metal layer and formed with a hole for partially exposing the second lower metal layer; a pad aligned on the second capping layer and connected to the second lower metal layer; a protective layer on the second capping layer; and a second upper metal layer aligned on the second capping layer.
申请公布号 US7781864(B2) 申请公布日期 2010.08.24
申请号 US20080330614 申请日期 2008.12.09
申请人 DONGBU HITEK CO., LTD. 发明人 KANG MYUNG-IL
分类号 H01L27/08;H01L27/10 主分类号 H01L27/08
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